[F-5-4] Low Temperature Ultra-thin Hafnium Oxide Dielectrics by Sputtering of Hf Metal on Tilted Substrate Followed by Nitric Acid Oxidation then Anodization Compensation in D. I. Water
Chia-Hua Chang, Jenn-Gwo Hwu
(1.Graduate Institute of Electronics Engineering / Department of Electrical Engineering, National Taiwan University)
https://doi.org/10.7567/SSDM.2007.F-5-4