[F-5-4] Low Temperature Ultra-thin Hafnium Oxide Dielectrics by Sputtering of Hf Metal on Tilted Substrate Followed by Nitric Acid Oxidation then Anodization Compensation in D. I. Water

Chia-Hua Chang、Jenn-Gwo Hwu (1.Graduate Institute of Electronics Engineering / Department of Electrical Engineering, National Taiwan University)

https://doi.org/10.7567/SSDM.2007.F-5-4