Self-aligned Fabrication Process for Pd-Contacted and PMMA-Passivated Carbon Nanotube Field-Effect Transistors

Lorraine Rispal; Hongyu Yang; Rudolf Heller; Gisela Hess; Gerhard Tzschockel; Udo Schwalke

doi:https://doi.org/10.7567/SSDM.2007.J-10-2

2007 International Conference on Solid State Devices and Materials

Sep 18, 2007 - Sep 21, 2007
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[J-10-2] Self-aligned Fabrication Process for Pd-Contacted and PMMA-Passivated Carbon Nanotube Field-Effect Transistors

Lorraine Rispal, Hongyu Yang, Rudolf Heller, Gisela Hess, Gerhard Tzschockel, Udo Schwalke (1.Institute for Semiconductor Technology, Darmstadt University of Technology)

https://doi.org/10.7567/SSDM.2007.J-10-2

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