Self-aligned Fabrication Process for Pd-Contacted and PMMA-Passivated Carbon Nanotube Field-Effect Transistors

Lorraine Rispal; Hongyu Yang; Rudolf Heller; Gisela Hess; Gerhard Tzschockel; Udo Schwalke

doi:https://doi.org/10.7567/SSDM.2007.J-10-2

2007 International Conference on Solid State Devices and Materials

2007年9月18日〜 2007年9月21日
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[J-10-2] Self-aligned Fabrication Process for Pd-Contacted and PMMA-Passivated Carbon Nanotube Field-Effect Transistors

Lorraine Rispal、Hongyu Yang、Rudolf Heller、Gisela Hess、Gerhard Tzschockel、Udo Schwalke (1.Institute for Semiconductor Technology, Darmstadt University of Technology)

https://doi.org/10.7567/SSDM.2007.J-10-2

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