A lithographical method by oxidization through a conductive template in contact with a silicon substrate mediated by a thin water layer

Chi-Hsiang Hsieh; Jiunn-Der Liao; Chang-shu Kuo; Chao-Yu Huang; Bo-Hsiung Wu

doi:https://doi.org/10.7567/SSDM.2007.P-1-3

[P-1-3] A lithographical method by oxidization through a conductive template in contact with a silicon substrate mediated by a thin water layer

Chi-Hsiang Hsieh、Jiunn-Der Liao、Chang-shu Kuo、Chao-Yu Huang、Bo-Hsiung Wu (1.Center for Micro/nano Science and Technology, National Cheng Kung University、2.Department of Materials Science and Engineering, National Cheng Kung University)

https://doi.org/10.7567/SSDM.2007.P-1-3

2007 International Conference on Solid State Devices and Materials

[P-1-3] A lithographical method by oxidization through a conductive template in contact with a silicon substrate mediated by a thin water layer