The Effect of Etch Stop Layer Stress on Negative Bias Temperature Instability of Deep Submicron p-MOSFETs

Ming Shing Chen; Y. K. Fang; T.H Lee; C.T. Lin; Joe Ko; Yau Kae Sheu; Tsong Lin Shen; Wen Yi Liao

doi:https://doi.org/10.7567/SSDM.2007.P-3-13

[P-3-13] The Effect of Etch Stop Layer Stress on Negative Bias Temperature Instability of Deep Submicron p-MOSFETs

Ming Shing Chen, Y. K. Fang, T.H Lee, C.T. Lin, Joe Ko, Yau Kae Sheu, Tsong Lin Shen, Wen Yi Liao (1.Institute of Microelectronics, National Cheng Kung University, 2.United Microelectronics Corporation (UMC), Specialty Technology Division)

https://doi.org/10.7567/SSDM.2007.P-3-13

2007 International Conference on Solid State Devices and Materials

[P-3-13] The Effect of Etch Stop Layer Stress on Negative Bias Temperature Instability of Deep Submicron p-MOSFETs