NBTI-Stress Induced Grain-Boundary Degradation in Low-Temperature Poly-Si Thin-Film Transistors

Chih-Yang Chen; Ming-Wen Ma; Wei-Cheng Chen; Hsiao-Yi Lin; Kuan-Lin Yeh; Shen-De Wang; Tan-Fu Lei

doi:https://doi.org/10.7567/SSDM.2007.P-3-17

2007 International Conference on Solid State Devices and Materials

2007年9月18日〜 2007年9月21日
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[P-3-17] NBTI-Stress Induced Grain-Boundary Degradation in Low-Temperature Poly-Si Thin-Film Transistors

Chih-Yang Chen、Ming-Wen Ma、Wei-Cheng Chen、Hsiao-Yi Lin、Kuan-Lin Yeh、Shen-De Wang、Tan-Fu Lei (1.Institute of Electronics, National Chiao Tung University、2.Toppoly Optoelectronics Corp.)

https://doi.org/10.7567/SSDM.2007.P-3-17

▲