The Japan Society of Applied Physics

[P-3-19] Accurate Extraction of Mobility, Effective Channel Length, and Source/Drain Resistance in 60 nm MOSFETs

Junsoo Kim, Jaehong Lee, Yeonam Yun, Byung-Gook Park, Jong Duk Lee, Hyungcheol Shin (1.Nano Systems Institutes, and School of EE, Seoul National University)

https://doi.org/10.7567/SSDM.2007.P-3-19