[A-6-1] Self-limiting Growth Behavior of Epitaxial NiSi₂ and its Impact on Controlled Silicidation of Metal Source/Drain in Silicon Nanowire MOSFETs

S. Migita¹, Y. Morita¹, N. Taoka¹, W. Mizubayashi¹, H. Ota¹ (1.AIST, Japan)

https://doi.org/10.7567/SSDM.2008.A-6-1