[A-9-2] Millisecond Rapid Thermal Annealing of Si Wafer Induced by High Density Thermal Plasma Jet Irradiation

H. Furukawa¹、S. Higashi¹、T. Okada¹、H. Murakami¹、S. Miyazaki¹ (1.Hiroshima Univ., Japan)

https://doi.org/10.7567/SSDM.2008.A-9-2