[A-9-2] Millisecond Rapid Thermal Annealing of Si Wafer Induced by High Density Thermal Plasma Jet Irradiation

H. Furukawa¹, S. Higashi¹, T. Okada¹, H. Murakami¹, S. Miyazaki¹ (1.Hiroshima Univ., Japan)

https://doi.org/10.7567/SSDM.2008.A-9-2