[C-5-1] Molecular Dynamics Simulations of Low-k SiOCH Film Etching by Fluorocarbon Plasmas

A. Suzuki¹、M. Isobe¹、S. Kobayashi²、M. Fukasawa²、T. Tatsumi²、S. Hamaguchi¹ (1.Osaka Univ.、2.Sony Corp., Japan)

https://doi.org/10.7567/SSDM.2008.C-5-1