[C-5-1] Molecular Dynamics Simulations of Low-k SiOCH Film Etching by Fluorocarbon Plasmas

A. Suzuki¹, M. Isobe¹, S. Kobayashi², M. Fukasawa², T. Tatsumi², S. Hamaguchi¹ (1.Osaka Univ., 2.Sony Corp., Japan)

https://doi.org/10.7567/SSDM.2008.C-5-1