Diagnostics of Plasma Induced Damages on Low-k SiOCH Films

S. Takashima; R. Saito; S. Uchida; K. Takeda; M. Fukasawa; K. Oshima; K. Nagahata; T. Tatsumi; M. Hori

doi:https://doi.org/10.7567/SSDM.2008.C-6-1

2008 International Conference on Solid State Devices and Materials

2008年9月23日〜 2008年9月26日
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

[C-6-1] Diagnostics of Plasma Induced Damages on Low-k SiOCH Films

S. Takashima¹、R. Saito¹、S. Uchida¹、K. Takeda¹、M. Fukasawa²、K. Oshima²、K. Nagahata²、T. Tatsumi²、M. Hori^1,3 (1.Nagoya Univ.、2.Sony Corp.、3.CREST-JST, Japan)

https://doi.org/10.7567/SSDM.2008.C-6-1

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