[C-9-1] Influence of Ti Liner on Resistivity of Copper Interconnects

H. Kitada¹、T. Suzuki¹、S. Akiyama²、T. Nakamura¹ (1.Fujitsu Labs. Ltd.、2.Fujitsu Microelectronics Ltd., Japan)

https://doi.org/10.7567/SSDM.2008.C-9-1