[C-9-1] Influence of Ti Liner on Resistivity of Copper Interconnects

H. Kitada¹, T. Suzuki¹, S. Akiyama², T. Nakamura¹ (1.Fujitsu Labs. Ltd., 2.Fujitsu Microelectronics Ltd., Japan)

https://doi.org/10.7567/SSDM.2008.C-9-1