[C-9-5] Kinetics of Self-Formation of Ti-based Barrier Layers in Cu(Ti)/Dielectric-Layer Samples

K. Kohama¹、K. Ito¹、K. Mori²、K. Maekawa²、Y. Shirai¹、M. Murakami³ (1.Kyoto Univ.、2.Renesas Tech. Corp.、3.Ritsumeikan Trust, Japan)

https://doi.org/10.7567/SSDM.2008.C-9-5