[C-9-5] Kinetics of Self-Formation of Ti-based Barrier Layers in Cu(Ti)/Dielectric-Layer Samples

K. Kohama¹, K. Ito¹, K. Mori², K. Maekawa², Y. Shirai¹, M. Murakami³ (1.Kyoto Univ., 2.Renesas Tech. Corp., 3.Ritsumeikan Trust, Japan)

https://doi.org/10.7567/SSDM.2008.C-9-5