Control of Structure and Electrical Properties of Carbon Nanowalls : Effect of N<sub>2</sub>/O<sub>2</sub> Addition to Fluorocarbon Plasma CVD with H Radical Injection

2008 International Conference on Solid State Devices and Materials

2008年9月23日〜 2008年9月26日
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

W. Takeuchi¹、M. Hiramatsu²、Y. Tokuda³、H. Kano⁴、M. Hori¹ (1.Nagoya Univ.、2.Meijo Univ.、3.Aichi Inst. of Tech.、4.NU Eco-Eng. Co., Ltd., Japan)