[F-1-5] Control of Structure and Electrical Properties of Carbon Nanowalls : Effect of N2/O2 Addition to Fluorocarbon Plasma CVD with H Radical Injection
W. Takeuchi1, M. Hiramatsu2, Y. Tokuda3, H. Kano4, M. Hori1
(1.Nagoya Univ., 2.Meijo Univ., 3.Aichi Inst. of Tech., 4.NU Eco-Eng. Co., Ltd., Japan)
https://doi.org/10.7567/SSDM.2008.F-1-5