The Japan Society of Applied Physics

[F-2-2] Effects of Ion-Bombardment-Assist and High Temperature on Growth of Zinc Oxide Films by Microwave Excited High Density Plasma Enhanced MOCVD

H. Asahara1,2, A. Inokuchi1,3, K. Watanuki1,4, M. Hirayama1, A. Teramoto1, T. Ohmi1 (1.Tohoku Univ., 2.ROHM Co., Ltd., 3.Tokyo Electron Ltd., 4.Ube Industries, Ltd., Japan)

https://doi.org/10.7567/SSDM.2008.F-2-2