The Japan Society of Applied Physics

[F-2-3] Y2O3 Buffer Layer for High-quality ZnO Epitaxial Growth on Si(111)

W. R. Liu1, Y. H. Li1, W. F. Hsieh1, C. H. Hsu1,2, W. C. Lee3, Y. J. Lee3, M. Hong3, J. Kwo3 (1.National Chiao Tung Univ., 2.National Synchrotron Radiation Res. Center, 3.National Tsing Hua Univ., Taiwan)

https://doi.org/10.7567/SSDM.2008.F-2-3