[F-2-7L] Roughness Reduction Technique for High Performance Poly-Si TFTs by CW Laser Lateral Crystallization with Cap SiO₂ Thin Films

S. Fujii¹、S. Kuroki¹、M. Numata¹、K. Kotani¹、T. Ito¹ (1.Tohoku Univ., Japan)

https://doi.org/10.7567/SSDM.2008.F-2-7L