Roughness Reduction Technique for High Performance Poly-Si TFTs by CW Laser Lateral Crystallization with Cap SiO<sub>2</sub> Thin Films

2008 International Conference on Solid State Devices and Materials

Sep 23, 2008 - Sep 26, 2008
Tsukuba International Congress Center (EPOCHAL TSUKUBA), Ibaraki, Japan

S. Fujii¹, S. Kuroki¹, M. Numata¹, K. Kotani¹, T. Ito¹ (1.Tohoku Univ., Japan)