[P-1-2] Thermal Stability and Scalability of Mictamict Ti-Si-N MOS Gate Electrodes

H. Kondo¹、K. Furumai¹、M. Sakashita¹、A. Sakai²、M. Ogawa¹、S. Zaima¹ (1.Nagoya Univ.、2.Osaka Univ., Japan)

https://doi.org/10.7567/SSDM.2008.P-1-2