[P-1-2] Thermal Stability and Scalability of Mictamict Ti-Si-N MOS Gate Electrodes

H. Kondo¹, K. Furumai¹, M. Sakashita¹, A. Sakai², M. Ogawa¹, S. Zaima¹ (1.Nagoya Univ., 2.Osaka Univ., Japan)

https://doi.org/10.7567/SSDM.2008.P-1-2