[P-2-3] Direct Observation of Tensile Stress in Silicon Oxide Films using Cathodoluminescence Spectroscopy
S. Kakinuma1, K. Nishikata1, N. Yamashita2, N. Naka1, S. Kashiwagi1, K. Matsumoto1, T. Namazu2, S. Inoue2
(1.HORIBA, Ltd., 2.Univ. of Hyogo, Japan)
https://doi.org/10.7567/SSDM.2008.P-2-3