[P-2-3] Direct Observation of Tensile Stress in Silicon Oxide Films using Cathodoluminescence Spectroscopy

S. Kakinuma¹、K. Nishikata¹、N. Yamashita²、N. Naka¹、S. Kashiwagi¹、K. Matsumoto¹、T. Namazu²、S. Inoue² (1.HORIBA, Ltd.、2.Univ. of Hyogo, Japan)

https://doi.org/10.7567/SSDM.2008.P-2-3