[P-2-4] Si-H Group Elimination Effect on the Properties of SiOCH Films: Theoretical Investigation

N. Tajima¹, M. Shinriki², Y. Xu³, T. Ohno¹ (1.NIMS, 2.Taiyo Nippon Sanso Corp., 3.Tri Chemical Labs. Inc., Japan)

https://doi.org/10.7567/SSDM.2008.P-2-4