[P-2-4] Si-H Group Elimination Effect on the Properties of SiOCH Films: Theoretical Investigation

N. Tajima¹、M. Shinriki²、Y. Xu³、T. Ohno¹ (1.NIMS、2.Taiyo Nippon Sanso Corp.、3.Tri Chemical Labs. Inc., Japan)

https://doi.org/10.7567/SSDM.2008.P-2-4