[P-3-3] The Impact of Pre-Ion Implantation (PII) on the Characteristics of Nickel Germanide Films and NiGe/Ge Schottky Diodes

X. An¹、C. Fan¹、R. Huang¹、X. Zhang¹ (1.Peking Univ., China)

https://doi.org/10.7567/SSDM.2008.P-3-3