[P-4-2] Nanoscale (EOT= 5.6 nm) Nonvolatile Memory Capacitors using Atomic Layer Deposited High-κ HfAlO Nanocrystals

S. Z. Rahaman¹、A. Das¹、S. Maikap¹ (1.Chang Gung Univ., Taiwan)

https://doi.org/10.7567/SSDM.2008.P-4-2