X-ray photoelectron spectroscopy study of dipole effects at HfO<sub>2</sub>/SiO<sub>2</sub>/Si stacks

2009 International Conference on Solid State Devices and Materials

Oct 6, 2009 - Oct 9, 2009
Sendai Kokusai Hotel, Miyagi, Japan

L. Q. Zhu¹, K. Kita¹, T. Nishimura¹, K. Nagashio¹, S. K. Wang¹, A. Toriumi¹ (1.Univ. of Tokyo)