[B-4-3] Influence of Post Cap-layer Deposition Annealing Temperature on MgO Diffusion in High-k/IFL Stacks

T. Morooka¹、T. Matsuki¹、T. Nabatame¹、J. Yugami¹、K. Ikeda¹、Y. Ohji¹ (1.Selete)

https://doi.org/10.7567/SSDM.2009.B-4-3