[B-6-2] Impact of Very Low Series Resistance due to Raised Metal S/D Structure with Very Low Contact Resistance Silicide for sub-100-nm nMOSFET

R. Kuroda¹, T. Isogai¹, H. Tanaka¹, Y. Nakao¹, A. Teramoto¹, S. Sugawa¹, T. Ohmi¹ (1.Tohoku Univ.)

https://doi.org/10.7567/SSDM.2009.B-6-2