Impact of Very Low Series Resistance due to Raised Metal S/D Structure with Very Low Contact Resistance Silicide for sub-100-nm nMOSFET

2009 International Conference on Solid State Devices and Materials

2009年10月6日〜 2009年10月9日
Sendai Kokusai Hotel, Miyagi, Japan

R. Kuroda¹、T. Isogai¹、H. Tanaka¹、Y. Nakao¹、A. Teramoto¹、S. Sugawa¹、T. Ohmi¹ (1.Tohoku Univ.)