[B-8-4] Concentration of Active Dopants at NiSi/Si Interface Segregated by "Snowplow" Effect for Schottky Barrier Height Tuning

S. Migita¹、Y. Morita¹、N. Taoka¹、W. Mizubayashi¹、H. Ota¹ (1.MIRAI-AIST)

https://doi.org/10.7567/SSDM.2009.B-8-4