[C-6-3] Novel Single Metal Gate CMOS Integration with Effective Workfunction Modulation by a Differential Spacer: Manipulation of Oxygen Vacancy

Y. H. Kim¹、K. Schonenberg¹、T. Ando¹、D. Neumayer¹、R. Mo¹、H. Bu¹、J. Sleight¹、E. Cartier¹、N. Moumen¹、R. Jha¹、W. Yan¹、Y. Liang¹、V. Narayanan¹、M. P. Chudzik¹、S. Guha¹ (1.IBM)

https://doi.org/10.7567/SSDM.2009.C-6-3