[D-5-2] Rutherford Backscattering Spectrometry Analysis of Growth of Ti-Rich Layer Formed at Cu(Ti)/Low-k Interfaces

K. Kohama¹、K. Ito¹、K. Mori²、K. Maekawa²、Y. Shirai¹、M. Murakami³ (1.Kyoto Univ.(Japan)、2.Renesas Tech. Corp.(Japan)、3.The Ritsumeikan Trust(Japan))

https://doi.org/10.7567/SSDM.2009.D-5-2