[D-8-3] Effect of UV Photons and Radicals for Low-Frequency Line-Edge Roughness (LER) of ArF Photo-resist during Fluorocarbon plasma etching

B. Jinnai¹、E. Soda^1,2、K. Koyama¹、S. Saito²、S. Samukawa¹ (1.Tohoku Univ.(Japan)、2.Selete(Japan))

https://doi.org/10.7567/SSDM.2009.D-8-3