[D-8-3] Effect of UV Photons and Radicals for Low-Frequency Line-Edge Roughness (LER) of ArF Photo-resist during Fluorocarbon plasma etching

B. Jinnai¹, E. Soda^1,2, K. Koyama¹, S. Saito², S. Samukawa¹ (1.Tohoku Univ.(Japan), 2.Selete(Japan))

https://doi.org/10.7567/SSDM.2009.D-8-3