[D-8-5] Super-Low-k SiOCH Film (k=1.9) with High Water Resistance and High Thermal Stability Formed by Neutral-Beam-Enhanced-CVD

T. Sasaki¹、S. Yasuhara¹、T. Shimayama²、K. Tajima²、H. Yano²、S. Kadomura²、M. Yoshimaru²、N. Matsunaga²、S. Samukawa¹ (1.Tohoku Univ.(Japan)、2.STARC(Japan))

https://doi.org/10.7567/SSDM.2009.D-8-5