The Japan Society of Applied Physics

[D-8-5] Super-Low-k SiOCH Film (k=1.9) with High Water Resistance and High Thermal Stability Formed by Neutral-Beam-Enhanced-CVD

T. Sasaki1, S. Yasuhara1, T. Shimayama2, K. Tajima2, H. Yano2, S. Kadomura2, M. Yoshimaru2, N. Matsunaga2, S. Samukawa1 (1.Tohoku Univ.(Japan), 2.STARC(Japan))

https://doi.org/10.7567/SSDM.2009.D-8-5