The Japan Society of Applied Physics

[F-3-2L] Mechanism of electromigration and spontaneous formation of single electron transistors at ultrasmall copper nano-junctions

S. Sakata1, A. Umeno1, K. Yoshida1, K. Hirakawa1,2 (1.Univ. of Tokyo(Japan), 2.CREST-JST(Japan))

https://doi.org/10.7567/SSDM.2009.F-3-2L