[F-3-2L] Mechanism of electromigration and spontaneous formation of single electron transistors at ultrasmall copper nano-junctions

S. Sakata¹、A. Umeno¹、K. Yoshida¹、K. Hirakawa^1,2 (1.Univ. of Tokyo(Japan)、2.CREST-JST(Japan))

https://doi.org/10.7567/SSDM.2009.F-3-2L