[H-2-4] Effect of Carrier Gas (Ar and He) on the Crystallographic Quality of Multi-layer Graphene Grown on Si by Photoemission-assisted Plasma CVD

H. Sumi¹, S. Ogawa^1,2, A. Saikubo^2,3, E. Ikenaga^2,3, M. Nihei^2,4, Y. Takakuwa^1,2 (1.Tohoku Univ.(Japan), 2.CREST-JST(Japan), 3.JASRI/SPring-8(Japan), 4.Fujitsu Ltd.(Japan))

https://doi.org/10.7567/SSDM.2009.H-2-4