The Japan Society of Applied Physics

[H-3-3] Prediction of Crystallization Temperature for HfO2 Thin Film in High Temperature Annealing Process by Reaction Time Accelerating Molecular Dynamics

K. Nishitani1,2、H. Yabuhara1、A. Endou2、A. Suzuki2、H. Tsuboi2、N. Hatakeyama2、H. Takaba2、M. Kubo2、A. Miyamoto2 (1.Toshiba Corp.(Japan)、2.Tohoku Univ.(Japan))

https://doi.org/10.7567/SSDM.2009.H-3-3