The Japan Society of Applied Physics

[H-3-4] Electrical and Physical Characteristics of the High-K Gd2O3 (Gadolinium) Dielectric Deposited on the Polycrystalline Silicon

J. S. Chiu1、C. H. Kao1、H. Chen2、P. Y. Tsung1、Y. C. Liao1、W. S. Liao1、Y. T. Chung1、H. C. Fan1、P. L. Lai1、C. Y. Huang1、C. S. Lin1、J. M. Dai1 (1.Chang Gung Univ.(Taiwan)、2.Chi Nan Univ.(Taiwan))

https://doi.org/10.7567/SSDM.2009.H-3-4