[P-1-11] Hole Tunnel Currents in TiN/HfSiOxN/SiO2/p-Si(100) MOS Capacitors
Khairurrijal1, F. A. Noor1, M. Abdullah1, Sukirno1, A. Ohta2, S. Miyazaki2
(1.Institut Teknologi Bandung(Indonesia), 2.Hiroshima Univ.(Japan))
https://doi.org/10.7567/SSDM.2009.P-1-11