[P-1-21] Low Contact Resistance with Low Silicide/p⁺-Silicon Schottky Barrier for High Performance p-channel MOSFETs

H. Tanaka¹, T. Isogai¹, T. Goto¹, A. Teramoto¹, S. Sugawa¹, T. Ohmi¹ (1.Tohoku Univ.)

https://doi.org/10.7567/SSDM.2009.P-1-21